4.6 Article

Formation of Nitrogen Doped Titanium Dioxide Surface Layer on NiTi Shape Memory Alloy

Journal

MATERIALS
Volume 14, Issue 6, Pages -

Publisher

MDPI
DOI: 10.3390/ma14061575

Keywords

NiTi alloy; glow discharge oxidation; structure; antibacterial properties

Funding

  1. [2015/17/B/ST8/00620]

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NiTi shape memory alloys are increasingly used in bone and cardiac implants, but their oxide layer may be harmful to the human body. Surface engineering techniques, such as low-temperature plasma oxidation and cathode sputtering, can improve the properties of these alloys. This study found that prior cathodic sputtering in argon-nitrogen plasma can enhance the thickness and antibacterial properties of nitrogen-doped titanium dioxide layers on NiTi implants.
NiTi shape memory alloys are increasingly being used as bone and cardiac implants. The oxide layer of nanometric thickness spontaneously formed on their surface does not sufficiently protect from nickel transition into surrounding tissues, and its presence, even in a small amount, can be harmful to the human organism. In order to limit this disadvantageous phenomenon, there are several surface engineering techniques used, including oxidation methods. Due to the usually complex shapes of implants, one of the most prospective methods is low-temperature plasma oxidation. This article presents the role of cathode sputtering in the formation of a titanium dioxide surface layer, specifically rutile. The surface of the NiTi shape memory alloy was modified using low-temperature glow discharge plasma oxidation processes, which were carried out in two variants: oxidation using an argon + oxygen (80% vol.) reactive atmosphere and the less chemically active argon + air (80% vol.), but with a preliminary cathode sputtering process in the Ar + N-2 (1:1) plasma. This paper presents the structure (STEM), chemical composition (EDS, SIMS), surface topography (optical profilometer, Atomic Force Microscopy-AFM) and antibacterial properties of nanocrystalline TiO2 diffusive surface layers. It is shown that prior cathodic sputtering in argon-nitrogen plasma almost doubled the thickness of the produced nitrogen-doped titanium dioxide layers despite using air instead of oxygen. The (TiOxNy)(2) diffusive surface layer showed a high level of resistance to E. coli colonization in comparison with NiTi, which indicates the possibility of using this surface layer in the modification of NiTi implants' properties.

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