4.7 Article

Degradation of ciprofloxacin using UV-based advanced removal processes: Comparison of persulfate-based advanced oxidation and sulfite-based advanced reduction processes

Journal

SCIENCE OF THE TOTAL ENVIRONMENT
Volume 764, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.scitotenv.2020.144510

Keywords

Sulfate radical based advanced oxidation processes; Advanced reduction processes; Ciprofloxacin; Defluorination

Funding

  1. Research Foundation -Flanders (FWO) [11D7418N]
  2. China Scholarship Council (CSC) [201606200054]

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In this study, the efficiency of UV-based sulfate radical advanced oxidation processes (SR-AOP) and UV-based advanced reduction processes (ARP) in degrading ciprofloxacin (CIP) in wastewater was investigated. It was found that the UV/PS process was more efficient than the UV/PMS process in SR-AOPs, while the UV/sulfite process was the most efficient among ARPs. The optimal process parameters and the contribution of different reactive species were determined for each process.
In this study, the degradation of ciprofloxacin (CIP) in wastewater was investigated using UV-based sulfate radical advanced oxidation processes (SR-AOP) and UV-based advanced reduction processes (ARP). More specifically, a comparison of the UV-based persulfate advanced oxidation process (the UV/PS process) and the UV-based sulfite advanced reduction process (the UV/sulfite process) was made. Considering the UV-based SR-AOPs, the UV/PS process was much more efficient than the UV-based peroxymonosulfate advanced oxidation process ( the UV/PMS process), with pseudo first order reaction rate constants (k(obs)) of 0.752 and 0.145 min(-1), respectively. For the UV-based ARPs, the UV/sulfite process was the most efficient, compared to the UV/sulfide and the UV/dithionite process (k(obs), of 0.269,0.0157 and 0.0329 min(-1), respectively). The optimal process parameters for both the UV/PS and the UV/sulfite process were determined and the contribution of the produced reactive species were identified. For the UV/PS process, maximal CIP degradation was found at pH 8, and both center dot OH and center dot SO4-, were responsible for CIP degradation. For the UV/sulfite process, center dot H and center dot e(aq)(-) were responsible for CIP degradation, with center dot e(aq)(-1) being the predominant radical at pH 8.5. Although CIP degradation was much faster for the UV/PS process, the UV/sulfite process was determined to be much more efficient in the defluorination of GP. (C) 2020 Elsevier B.V. All rights reserved.

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