4.4 Article

A shear stress model of water-based magnetorheological polishing fluids

Journal

Publisher

SAGE PUBLICATIONS LTD
DOI: 10.1177/1045389X211011660

Keywords

Magnetorheological polishing fluid; shear stress; Coulomb's law; exponential function

Funding

  1. Fundamental Research Funds for the Central Universities [2019YJ S163]

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A new shear stress model of MRPF is proposed in this study, which explains the relationship between the number of sliding particles and shear rate using an exponential function. The theoretical model effectively explains the variation of shear stress with shear rate compared to experimental data. The correctness of the particle slip hypothesis has been verified by finite element method.
Magnetorheological polishing fluid (MRPF) with excellent rheological characteristics are efficient in material removal of workpiece. Shear stress is an important evaluation index of rheological characteristics, and is also an important research field of MRPF. In this study, a new shear stress model of MRPF is proposed, which is based on the application of Coulomb's law in magnetic field. The interaction between magnetic particles on different magnetic chains and the effects of abrasive particles are considered in this model. The proposed model assumes that magnetic particles of MRPF slide in horizontal direction with shear behavior, and the exponential function is introduced to explain the relationship between the number of particles sliding and shear rate. Furthermore, the relationship between shear stress and shear rate is obtained by mathematical method. Compared with experimental data, theoretical model can effectively explain the variation of shear stress with shear rate. The correctness of the particle slip hypothesis has been verified by finite element method.

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