Optical interpretation for plasmonic adjustment of nanostructured Ag-NiO thin films

Ultrathin Ag and Ni/NiO films are sequentially produced on Corning glass and silicon substrates by means of magnetron sputtering. Post annealing treatment in a furnace with air at 420 degrees C and 500 degrees C may lead to the formation of Ag nanostructures in NiO environment. Some of these samples present local surface plasmon resonances (SPRs). The sequence in which each layer is deposited, as well as, the state of the structure on which the layer is deposited, appears to play a pivotal role in the optical properties of these nanostructures, which are attributed to the growth properties of the nanocomposite thin films. Ultimately, rigorous theoretical calculations have been made for comparison and discussion with the experimental results.

Automated summary

Ultrathin Ag and Ni/NiO films were produced on Corning glass and silicon substrates using magnetron sputtering, with post annealing treatment leading to the formation of Ag nanostructures in NiO environment. The optical properties of these nanostructures, attributed to the growth properties of nanocomposite thin films, appear to be influenced by the sequence of deposition and the state of the structure on which the layer is deposited. Rigorous theoretical calculations were conducted for comparison and discussion with experimental results.