Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 68, Issue 4, Pages 1411-1419Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2021.3055171
Keywords
Defects; gate dielectrics; IETS; inelastic electron tunneling spectroscopy (IETS); molecular junctions
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Inelastic electron tunneling spectroscopy (IETS) is a critical measurement technique for scrutinizing material structures and molecular compositions in metal-oxide-semiconductor (MOS) structures and molecular devices, providing important information regarding bond structures, impurities, defects, traps, molecular conformation, isomerization, and contact geometry.
To overcome the numerous challenges for the miniaturization of complementary metal-oxide-semiconductor (CMOS) technology, diverse materials have been examined using various characterization methods. Inelastic electron tunneling spectroscopy (IETS) has been regarded as a critical measurement technique to scrutinize materials. This is because the high sensitivity of IETS can provide important information regarding the material structures and molecular compositions (bonding structures, impurities, defects, and traps) in metal-oxide-semiconductor (MOS) structures, as well as the molecular conformation/isomerization, and contact geometry in molecular devices. This review introduces the background of IETS and recent applications of IETS on thin gate dielectrics, large DNA molecules, functional molecules, and diatomic molecules.
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