Master origination by 248nm DUV lithography for plasmonic color generation

Plasmonic color metasurfaces enable high resolution, ink-free color decoration and sensing devices. This work presents a full solution from design of plasmonic color elements suitable for master origination by 248nm Deep Ultraviolet (DUV) lithography to production grade manufacture of plasmonic color metasurfaces on plastic substrates. Design of hybrid aluminum disk-hole structures with hybridized multiple resonances, which are controlled by the disk-hole distance, enables plasmonic color generation across the visible spectrum with larger sized nanostructures, above 160nm. Such larger structures can be defined by 248nm DUV lithography as a cost-efficient and high throughput alternative to, e.g., electron beam lithography.

Automated summary

This work presents a comprehensive solution for the design of plasmonic color elements suitable for lithography and production grade manufacture of plasmonic color metasurfaces on plastic substrates. The hybrid aluminum disk-hole structures with controlled multiple resonances enable plasmonic color generation across the visible spectrum with larger sized nanostructures, which can be defined by 248nm DUV lithography as a cost-efficient and high throughput alternative to electron beam lithography.