4.6 Article

Improving Conceptual Modeling with Object-Process Methodology Stereotypes

Journal

APPLIED SCIENCES-BASEL
Volume 11, Issue 5, Pages -

Publisher

MDPI
DOI: 10.3390/app11052301

Keywords

model-based systems engineering (MBSE); object-process methodology (OPM) ISO 19450; stereotypes; conceptual modeling

Funding

  1. Gordon Center for Systems Engineering at the Technion, Israel Institute for Technology [2029853]

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The introduction of stereotypes in modeling plays a crucial role in improving system development success. Conceptual modeling is essential for understanding, designing, and managing engineering systems. Modern modeling languages with stereotypes help standardize, clarify model semantics, and enhance model comprehensibility.
Featured Application Introducing into OPM ISO 19450 modeling the ability to define and deploy stereotypes enables improved systems development using standardized complex structures and constrains. As system complexity is on the rise, there is a growing need for standardized building blocks to increase the likelihood of systems' success. Conceptual modeling is the primary activity required for engineering systems to be understood, designed, and managed. Modern modeling languages enable describing the requirements and design of systems in a formal yet understandable way. These languages use stereotypes to standardize, clarify the model semantics, and extend the meaning of model elements. An Internet of things (IoT) system serves as an example to show the significant contributions of stereotypes to model construction, comprehension, error reduction, and increased productivity during design, simulation, and combined hardware-software system execution. This research emphasizes stereotype features that are unique to Object-Process Methodology (OPM) ISO 19450, differentiating it from stereotypes in other conceptual modeling languages. We present the implementation of stereotypes in OPCloud, an OPM modeling software environment, explore stereotype-related problems, propose solutions, and discuss future enhancements.

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