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Surface transfer doping of diamond: A review

Journal

PROGRESS IN SURFACE SCIENCE
Volume 96, Issue 1, Pages -

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.progsurf.2021.100613

Keywords

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Funding

  1. UK Engineering and Physical Sciences Research Council [EP/E054668/1]
  2. UK Defence Science and Technology Laboratory

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Ultra-wide bandgap materials, such as diamond, have shown great potential for high-power, high-temperature electronics, sensing, and quantum applications. Surface transfer doping has been a successful alternative approach to transform intrinsically insulating diamond surfaces into semiconductors without traditional impurity doping.
Ultra-wide bandgap materials show great promise as a solution to some of the limitations of current state of the art semiconductor technology. Among these, diamond has exhibited great potential for use in high-power, high-temperature electronics, as well as sensing and quantum applications. Yet, significant challenges associated with impurity doping of the constrained diamond lattice remain a primary impediment towards the development of diamond-based electronic devices. An alternative approach, used with continued success to unlock the use of diamond for semiconductor applications, has been that of ?surface transfer doping? -a process by which intrinsically insulating diamond surfaces can be made semiconducting without the need for traditional impurity doping. Here, we present a review of progress in surface transfer doping of diamond, both a history and current outlook of this highly exploitable attribute.

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