Plasma etched PMMA/CaF2 anti-reflection coating for light weight PV module

Polymethylmethacrylate (PMMA) is an ideal replacement of glass where impact of weight is a serious issue. PMMA surface can be modified to make it highly transparent substrate. PMMA substrate was etched using a plasma etching system with oxygen plasma. CaF2 was deposited on to the etched PMMA via vacuum thermal evaporation to create anti-reflection coating. The effects of the treated PMMA were analysed using different characterisation techniques. An average increase in transmittance of approximately 4% was observed on 50 W RF power treated PMMA, compared to untreated PMMA in the broadband spectrum of 400-1100 nm. An enhancement in short circuit current from 36.71 to 37.62 mA/cm2 and an increase in efficiency of 2.35% was achieved when the treated PMMA was placed on a solar cell as a front cover sheet to model a lightweight photovoltaic module. These findings indicate the possibility of improving the surface morphology, optical and electrical characteristics of PMMA via treatment for photovoltaic applications.

Automated summary

Treatment of PMMA can increase its transmittance by approximately 4% across a broad spectrum, and when applied as a front cover sheet on a solar cell, treated PMMA can enhance short circuit current and efficiency, indicating improved optical and electrical characteristics for photovoltaic applications.