Use of nanostructured alumina thin films in multilayer anti-reflective coatings

A new method for modification of planar multilayer structures to create nanostructured aluminum oxide anti-reflection coatings is reported. The method is non-toxic and low-cost, being based on treatment of the coating with heated de-ionized water after the deposition of aluminum oxide. The results show that the method provides a viable alternative for attaining a low reflectance ARC. In particular, a low average reflectivity of similar to 3.3% is demonstrated in a broadband spectrum extending from 400 nm to 2000 nm for ARCs deposited on GaInP solar-cells, the typical material used as top-junction in solar cell tandem architectures. Moreover, the process is compatible with volume manufacturing technologies used in photovoltaics, such as ion beam sputtering and electron beam evaporation.

Automated summary

A new method involving treatment of the coating with heated de-ionized water after the deposition of aluminum oxide has been developed to create nanostructured aluminum oxide anti-reflection coatings with a low average reflectivity of approximately 3.3% in a broad spectrum range. This method, which is non-toxic and low-cost, is also compatible with volume manufacturing technologies used in photovoltaics such as ion beam sputtering and electron beam evaporation.