4.6 Article

Fabrication of TiO2-based broadband single-layer anti-reflection coating by collimated glancing angle deposition technique

Journal

NANOTECHNOLOGY
Volume 32, Issue 24, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6528/abeb98

Keywords

glancing angle deposition (GLAD); collimation; refractive index tailoring; TiO2; anti-reflection; thin film

Funding

  1. BARCF Visakhapatnam

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The study utilized a modified glancing angle deposition (GLAD) technique to prepare single-sided TiO2 thin films, with an additional flux collimation plate introduced to enhance the collimation of depositing vapour flux. The reduction in TiO2 film refractive index was observed with increasing distance from the vapour source, resulting in excellent anti-reflection properties in coatings deposited at distant positions. The research demonstrates the lowest refractive index of TiO2 achieved together with the fabrication of a TiO2-based broadband single-layer anti-reflection coating.
Single-sided TiO2 thin films were prepared using a modified glancing angle deposition (GLAD) technique. An additional flux collimation plate was introduced into the GLAD arrangement to enhance the degree of collimation of depositing vapour flux. Enhancement in the ballistic growth of film on the substrate was observed with increasing distance from the vapour source. The substrate position near to the vapour source (i.e. bottom region) showed a high refractive index (RI, similar to 1.336 @ 550 nm wavelength) and lower average film transmittance (similar to 94.5% in 400-900 nm wavelength range) compared to the others. In contrast, the TiO2 coating deposited at a distant position from the source (i.e. top region) showed a remarkably low RI (similar to 1.190 @ 550 nm wavelength) and excellent anti-reflection over a broad spectral region with a maximum average transmittance (similar to 95.3% in 400-900 nm wavelength) compared to the other substrate positions. The reduction in film RI was correlated qualitatively with the morphological alterations in the coating for different substrate positions. With a further increase in distance from the vapour source, an ultimate reduction in the RI of TiO2 to similar to 1.101 was observed, which was similar to 50% lower than the bulk TiO2 value (similar to 2.221 @ 550 nm wavelength). The present study reports the lowest RI of TiO2 together with fabrication of a TiO2-based broadband single-layer anti-reflection coating.

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