Related references
Note: Only part of the references are listed.Wafer-scale epitaxial germanium (100), (111), (110) films on silicon using liquid phase crystallization
Saloni Chaurasia et al.
AIP ADVANCES (2018)
Diode laser annealing of epitaxy Ge on sapphire (0001) grown by magnetron sputtering
Ziheng Liu et al.
MATERIALS LETTERS (2017)
Nanosecond pulsed laser ablation of Ge investigated by employing photoacoustic deflection technique and SEM analysis
Nazish Yaseen et al.
PHYSICA B-CONDENSED MATTER (2016)
Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber
Kwang Hong Lee et al.
AIP ADVANCES (2013)
Epitaxial Growth of Germanium on Silicon for Light Emitters
Chengzhao Chen et al.
INTERNATIONAL JOURNAL OF PHOTOENERGY (2012)
Sputtered amorphous silicon thin films for diode laser crystallization
G. Schmidl et al.
MATERIALS LETTERS (2012)
Growth and characterization of germanium epitaxial film on silicon (001) using reduced pressure chemical vapor deposition
Y. H. Tan et al.
THIN SOLID FILMS (2012)
Mid-infrared photonics in silicon and germanium
Richard Soref
NATURE PHOTONICS (2010)
Germanium waveguide photodetectors integrated on silicon with MBE
M. Oehme et al.
THIN SOLID FILMS (2008)
Electrical characterization of germanium p-channel MOSFETs
H Shang et al.
IEEE ELECTRON DEVICE LETTERS (2003)
Share Paper
