Improved thermal stability of zirconia macroporous structures via homogeneous aluminum oxide doping and nanostructuring using atomic layer deposition

Dopants are regularly used in sol-gel and powder metallurgy routes, however, the controlled insertion of such is quite challenging, especially in the case of nanostructures. Here we investigate the use of atomic layer deposition (ALD) as a potential technique to precisely introduce aluminum oxide as dopant or second phase into zirconia 3D macroporous nanostructures. The results show that the introduction of high Al2O3 contents into the zirconia nanostructures successfully inhibited sintering when in comparison to undoped zirconia. Moreover, for the multinanolaminated and full-mix structures, the tetragonal phase was stabilized up to 1200 ?C. Furthermore, the structures presented a photonic band gap even after heat treatment at 1200 ?C for 2 h, enabling its application as inverse opal photonic crystals in high-temperature environments. The enhancement of thermal stability and high-temperature tetragonal phase stabilization is enabled jointly by the nanostructuring and homogeneous distribution of aluminum oxide provided by ALD super-cycles.

Automated summary

The study demonstrates that using ALD technique can successfully introduce high Al2O3 content into zirconia nanostructures, inhibiting sintering compared to undoped zirconia. Additionally, for multinanolaminated and full-mix structures, tetragonal phase is stabilized up to 1200?C. The structures also exhibit a photonic band gap even after being heat treated at 1200?C for 2 hours, making them suitable for application as inverse opal photonic crystals in high-temperature environments.