Friction control by engineering the crystallographic orientation of the lubricating few-layer MoS2 films

Tribological properties of a surface are controlled by its topography and chemical structure as suggested by theoretical studies. However, the effect of crystallographic orientation on the tribological properties is still controversial. By tuning the heating rate during sulfurization of CVD Mo films, we prepared the few-layer MoS2 films with similar surface topography but different crystallographic c-axis orientation. This resulted in distinctly different tribological behavior both on the nanoscale and macroscale that can be attributed to different surface chemistry and surface electronic and phonon structures. In particular, horizontally aligned MoS2 sheets with c axis oriented along the surface normal favor the weak van der Waals forces which resulted in a twice lower coefficient of friction comparing to the vertically aligned MoS2 sheets. These results demonstrate the possibility to optimize tribological properties by crystallographic orientation as required for the thin solid-state lubricating layers for extreme conditions.

Automated summary

The tribological properties of MoS2 films can be optimized by adjusting the crystallographic orientation, leading to different friction behaviors. Horizontally oriented MoS2 sheets exhibit a lower coefficient of friction compared to vertically oriented sheets.