4.7 Article

Sub-7-nm textured ZrO2 with giant ferroelectricity

Journal

ACTA MATERIALIA
Volume 205, Issue -, Pages -

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2020.116536

Keywords

Zirconia; Ferroelectricity; Piezoelectricity; Crystallographic orientation; Thin films

Funding

  1. Taiwan Semiconductor Manufacturing Company (TSMC)
  2. Ministry of Science and Technology, Taiwan [MOST 109-2218-E-002-032, 1092221-E-002-123-MY3, 109-3116-F-002-0 04-CC1]

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The study reports a similar to 6.5 nm pure ZrO2 thin film with a giant ferroelectric remanent polarization and effective piezoelectric coefficient on a Pt electrode, demonstrating excellent crystal orientation, which has potential implications for research and applications in nanoscale ferroelectric thin films.
An similar to 6.5 nm pure ZrO2 thin film with a giant ferroelectric remanent polarization (P-r) of similar to 50 mu Ccm(-2) and an effective piezoelectric coefficient (d(33)) of 7-9 pm/V is reported. The film was prepared on a (111)oriented Pt electrode using plasma-enhanced atomic layer deposition at 300 degrees C, followed by annealing at 400 degrees C, and exhibited a preferred orientation of the orthorhombic (111) planes in the in-plane direction. The P-r value of similar to 50 mu Ccm(-2) is the largest reported to date for both perovskite and fluorite nanoscale ferroelectric thin films (< 120 nm) on a Pt electrode. Furthermore, the processing temperature of 300-400 degrees C is the lowest reported to date to produce a P-r of similar to 50 mu Ccm(-2) in nanoscale ferroelectrics on a Pt electrode. The giant P-r, ascribed to the preferred crystal orientation, was confirmed by the positive-up negative-down (PUND) polarization measurement with a long delay time to allow the relaxation of polarization. The effective d 33 was obtained using piezoresponse force microscopy with an interferometric displacement sensor to minimize the frequency-dependent artifacts and the effects of cantilever dynamics. The low-temperature preparation of the textured ZrO2 ultrathin film with a giant P-r is extremely advantageous for device scaling and process integration in advanced nanoelectronics. (C) 2020 Acta Materialia Inc. PublishedbyElsevierLtd. Allrightsreserved.

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