4.6 Article

Investigation of Structural and Optoelectronic Properties of Organic Semiconductor Film Based on 8-Hydroxyquinoline Zinc

Journal

ELECTRONICS
Volume 10, Issue 2, Pages -

Publisher

MDPI
DOI: 10.3390/electronics10020117

Keywords

DFT calculations; thin film; photoactive layer; optical properties; electrical properties

Funding

  1. Anahuac Mexico University [NNAIASEVM16070616]
  2. Direccion General de Computo y de Tecnologias de la Informacion (DGTIC-UNAM) [CAD-UNAM-DGTIC-298]

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This study optimized an organic semiconductor through density-functional theory methods, successfully deposited and characterized thin films of ZnQ(2)-TCNQ, investigated their optical properties, and determined the optical bandgap. A flexible photo device was manufactured with the active layer, showing significant changes in electrical behavior under light conditions.
In this work, we investigated an organic semiconductor based on zinc 8-hydroxyquinoline (ZnQ(2)) and tetracyanoquinodimethane (TCNQ), which can be used as a photoactive layer in organic devices. The semiconductor was optimized by applying density-functional theory (DFT) methods, and four hydrogen bridges were formed between ZnQ(2) and TCNQ. Later, thin films of ZnQ(2)-TCNQ were successfully deposited. The films were structurally and morphologically characterized, and the optical characteristics of the photoactive layer were investigated using ultraviolet-visible spectroscopy and time-dependent density-functional theory (TDDFT) calculations. The comparison and analysis of the experimental and theoretical absorption spectra indicate that the optical bandgap of the photoactive layer is 2.4 eV. Additionally, a flexible photo device was manufactured with the active layer ZnQ(2)-TCNQ, and its electrical behavior was evaluated under dark and light conditions. The results show a significant change in the behavior of the device when radiation is eliminated; the layer is light sensitive. The electrical resistance in the flexible photo device is associated with the optical behavior of the materials that constitute the active layer.

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