Related references
Note: Only part of the references are listed.Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge
Rainer Hippler et al.
APPLIED PHYSICS LETTERS (2020)
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
Hamidreza Hajihoseini et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2020)
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength
Nils Brenning et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2020)
Physics and technology of magnetron sputtering discharges
J. T. Gudmundsson
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS
K. Bernatova et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Electron density, temperature and the potential structure of spokes in HiPIMS
J. Held et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering
Martin Rudolph et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Bipolar HiPIMS for tailoring ion energies in thin film deposition
Julien Keraudy et al.
SURFACE & COATINGS TECHNOLOGY (2019)
Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film
Grzegorz Greczynski et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
Ion density evolution in a high-power sputtering discharge with bipolar pulsing
N. Britun et al.
APPLIED PHYSICS LETTERS (2018)
External magnetic field increases both plasma generation and deposition rate in HiPIMS
R. Ganesan et al.
SURFACE & COATINGS TECHNOLOGY (2018)
Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration
Vasile Tiron et al.
SURFACE & COATINGS TECHNOLOGY (2018)
Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films
Martin Rudolph et al.
THIN SOLID FILMS (2018)
Cu films prepared by bipolar pulsed high power impulse magnetron sputtering
Baohua Wu et al.
VACUUM (2018)
On three different ways to quantify the degree of ionization in sputtering magnetrons
Alexandre Butler et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2018)
Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate
M. Rudolph et al.
THIN SOLID FILMS (2017)
Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputtering
H. Hajihoseini et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2017)
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons
N. Brenning et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2017)
Particle-balance models for pulsed sputtering magnetrons
Chunqing Huo et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2017)
Mass spectrometry analyzes to highlight differences between short and long HiPIMS discharges
Axel Ferrec et al.
APPLIED SURFACE SCIENCE (2016)
An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge
J. T. Gudmundsson et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2016)
The effect of changing the magnetic field strength on HiPIMS deposition rates
J. W. Bradley et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2015)
High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation
W Breilmann et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2015)
Ionization of sputtered Ti, Al, and C coupled with plasma characterization in HiPIMS
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2015)
On the HiPIMS benefits of multi-pulse operating mode
O. Antonin et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2015)
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
Tomas Kubart et al.
SURFACE & COATINGS TECHNOLOGY (2014)
Spokes and charged particle transport in HiPIMS magnetrons
N. Brenning et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2013)
Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux
J. Capek et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2013)
On sheath energization and Ohmic heating in sputtering magnetrons
Chunqing Huo et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2013)
Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and deposited film structure
Takeo Nakano et al.
VACUUM (2013)
An introduction to thin film processing using high-power impulse magnetron sputtering
Daniel Lundin et al.
JOURNAL OF MATERIALS RESEARCH (2012)
Influence of ionization degree on film properties when using high power impulse magnetron sputtering
Mattias Samuelsson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
High power impulse magnetron sputtering discharge
J. T. Gudmundsson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
The evolution of the IEDFs in a low-pressure HiPIMS discharge
P. Poolcharuansin et al.
SURFACE & COATINGS TECHNOLOGY (2011)
Deposition rates of high power impulse magnetron sputtering: Physics and economics
Andre Anders
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2010)
A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering
J. Vlcek et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate
Anurag Mishra et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
A structure zone diagram including plasma-based deposition and ion etching
Andre Anders
THIN SOLID FILMS (2010)
Cross-field ion transport during high power impulse magnetron sputtering
Daniel Lundin et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2008)
The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
Jens Emmerlich et al.
VACUUM (2008)
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
Andre Anders et al.
JOURNAL OF APPLIED PHYSICS (2007)
Experimental study of a pre-ionized high power pulsed magnetron discharge
P. Vasina et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2007)
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
Guiding the deposition flux in an ionized magnetron discharge
J. Bohlmark et al.
THIN SOLID FILMS (2006)
Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson et al.
THIN SOLID FILMS (2006)
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
S Konstantinidis et al.
JOURNAL OF APPLIED PHYSICS (2006)
Target material pathways model for high power pulsed magnetron sputtering
DJ Christie
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)