Journal
OPTICS LETTERS
Volume 46, Issue 4, Pages 864-867Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.414580
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- Ministry of Science and Technology, Taiwan [MOST 109-2636-E-194-002]
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This study demonstrates the first mid-infrared lateral p-i-n GeSn waveguide photodetectors on silicon, utilizing GeSn alloys as the active material to achieve efficient photodetection. By designing and fabricating a lateral p-i-n homojunction diode, optical responsivity was significantly enhanced, leading to a photodetection range of up to 1950 nm with a good responsivity of 0.292 A/W at 1800 nm.
In this Letter, we demonstrate mid-infrared (MIR) lateral p-i-n GeSn waveguide photodetectors (WGPDs) on silicon, to the best of our knowledge for the first time, as a key enabler of MIR electronic-photonic integrated circuits (EPICs). Narrow-bandgap GeSn alloys were employed as the active material to enable efficient photodetection in the MIR region. A lateral p-i-n homojunction diode was designed and fabricated to significantly enhance the optical confinement factor of the guided modes and thus enhance the optical responsivity. Thus, a photodetection range of up to 1950 nm and a good responsivity of 0.292 A/W at 1800 nm were achieved. These results demonstrate the feasibility of planar GeSn WGPDs for monolithic MIR EPICs on silicon. (C) 2021 Optical Society of America
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