4.6 Article

Comprehensive model toward optimization of SAG In-rich InGaN nanorods by hydride vapor phase epitaxy

Journal

NANOTECHNOLOGY
Volume 32, Issue 15, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6528/abdb16

Keywords

InGaN nanorods; HVPE; selective area growth; model

Funding

  1. CNRS [PRC1300 CNRSJSPS]
  2. GaNeX program of the French ANR agency [ANR-11-LABX-0014]
  3. program 'Investissements d'avenir' of the French ANR agency
  4. French government IDEX-SITE initiative [16-muIDEX-0001 (CAP20-25)]
  5. European Commission (Auvergne FEDER Funds)
  6. Region Auvergne [ANR-10- LABX-16-01, 17 011236 01- 61617]
  7. Russian Science Foundation [19-72-30004]

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This study demonstrates the controlled growth of In-rich InGaN nanowires/nanorods using hydride vapor phase epitaxy, showing that different indium contents can be achieved by varying the In/Ga flow ratio. The presence of nanowires on the surface of grown NRs is proportional to the Ga content, with nanowire density reduced by increasing NH3 content. Theoretical modeling supports the idea that the emergence of nanowires is related to the final stage of growth and can be controlled by manipulating NH3 partial pressure.
Controlled growth of In-rich InGaN nanowires/nanorods (NRs) has long been considered as a very challenging task. Here, we present the first attempt to fabricate InGaN NRs by selective area growth using hydride vapor phase epitaxy. It is shown that InGaN NRs with different indium contents up to 90% can be grown by varying the In/Ga flow ratio. Furthermore, nanowires are observed on the surface of the grown NRs with a density that is proportional to the Ga content. The impact of varying the NH3 partial pressure is investigated to suppress the growth of these nanowires. It is shown that the nanowire density is considerably reduced by increasing the NH3 content in the vapor phase. We attribute the emergence of the nanowires to the final step of growth occurring after stopping the NH3 flow and cooling down the substrate. This is supported by a theoretical model based on the calculation of the supersaturation of the ternary InGaN alloy in interaction with the vapor phase as a function of different parameters assessed at the end of growth. It is shown that the decomposition of the InGaN solid alloy indeed becomes favorable below a critical value of the NH3 partial pressure. The time needed to reach this value increases with increasing the input flow of NH3, and therefore the alloy decomposition leading to the formation of nanowires becomes less effective. These results should be useful for fundamental understanding of the growth of InGaN nanostructures and may help to control their morphology and chemical composition required for device applications.

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