Related references
Note: Only part of the references are listed.HiPIMS optimization by using mixed high-power and low-power pulsing
Nils Brenning et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2021)
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering
Hamidreza Hajihoseini et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2020)
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength
Nils Brenning et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2020)
Physics and technology of magnetron sputtering discharges
J. T. Gudmundsson
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering
Martin Rudolph et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2020)
Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film
Grzegorz Greczynski et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
On three different ways to quantify the degree of ionization in sputtering magnetrons
Alexandre Butler et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2018)
Particle-balance models for pulsed sputtering magnetrons
Chunqing Huo et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2017)
The effect of changing the magnetic field strength on HiPIMS deposition rates
J. W. Bradley et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2015)
Particle visualization in high-power impulse magnetron sputtering. I. 2D density mapping
Nikolay Britun et al.
JOURNAL OF APPLIED PHYSICS (2015)
Particle visualization in high-power impulse magnetron sputtering. II. Absolute density dynamics
Nikolay Britun et al.
JOURNAL OF APPLIED PHYSICS (2015)
On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics
Chunqing Huo et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2014)
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
Tomas Kubart et al.
SURFACE & COATINGS TECHNOLOGY (2014)
Drifting potential humps in ionization zones: The propeller blades of high power impulse magnetron sputtering
Andre Anders et al.
APPLIED PHYSICS LETTERS (2013)
Spokes and charged particle transport in HiPIMS magnetrons
N. Brenning et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2013)
On sheath energization and Ohmic heating in sputtering magnetrons
Chunqing Huo et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2013)
Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering
Andre Anders et al.
JOURNAL OF APPLIED PHYSICS (2012)
Influence of ionization degree on film properties when using high power impulse magnetron sputtering
Mattias Samuelsson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
High power impulse magnetron sputtering discharge
J. T. Gudmundsson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
N. Brenning et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2012)
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
Chunqing Huo et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2012)
Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics
C. Vitelaru et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2012)
An ionization region model for high-power impulse magnetron sputtering discharges
M. A. Raadu et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2011)
Deposition rates of high power impulse magnetron sputtering: Physics and economics
Andre Anders
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2010)
A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering
J. Vlcek et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2010)
Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson et al.
THIN SOLID FILMS (2006)
Target material pathways model for high power pulsed magnetron sputtering
DJ Christie
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Collision cross sections for argon atoms with argon atoms for energies from 0.01 eV to 10 keV
AV Phelps et al.
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS (2000)