Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films

The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW)(1-x)N-x high entropy alloy thin films is investigated. The films were synthesized by two different physical vapor deposition methods, cathodic arc deposition and direct current magnetron sputtering, onto silicon and polyimide substrates. Regardless of the deposition method, a change from body centered cubic to face centered cubic structure was observed with increasing nitrogen content in the film. This structural change was accompanied by an increase in hardness as measured by nanoindentation but also by a material embrittlement as determined from tensile straining tests. (C) 2020 Elsevier B.V. All rights reserved.

Automated summary

The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW)(1-x)N-x high entropy alloy thin films is investigated in this study. The structural change from body centered cubic to face centered cubic with increasing nitrogen content resulted in increased hardness but also material embrittlement. The films were synthesized by two different physical vapor deposition methods onto silicon and polyimide substrates.