Journal
DALTON TRANSACTIONS
Volume 45, Issue 18, Pages 7570-7580Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c6dt00003g
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Funding
- Japan Society for the promotion of Science (JSPS) [15K05458, 15K05459]
- Ministry of Education, Science, Sports, and Culture of Japan (MEXT) [15H00940, 15H00957, 15H00958]
- Kyoto Technoscience Center
- TOYOTA Motor Corporation
- Grants-in-Aid for Scientific Research [15H03770, 15K13662, 15H00957, 15H00940, 15K05459, 15H00958, 15K05458] Funding Source: KAKEN
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We report the iridium hydride-mediated Si-Cl and Ge-Cl sigma-bond activation in a low-polarity toluene solution owing to diphosphine-chelation, in which the Si-Cl and Ge-Cl sigma-bonds are readily cleaved through an S(N)2-type pathway via the formation of a free chloride anion.
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