4.6 Article

Ultra-Precision Processing of Conductive Materials via Electrorheological Fluid-Assisted Polishing

Journal

ADVANCED ENGINEERING MATERIALS
Volume 23, Issue 3, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adem.202001109

Keywords

conductive materials; electrorheological fluids; material removal; polishing; ultra-precision processing

Funding

  1. Science and Technology Development Project of Jilin, China [JJKH20156413]
  2. Michigan State University

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This study investigates the feasibility and performance of electrorheological fluid-assisted polishing (ERFP) approach in processing conductive materials, deriving a theoretical model for calculating material removal volume and confirming the effectiveness of the proposed model through experimental results. The experiment demonstrates that the removal volume decreases with increasing gap size and rotation speed, while ERFP shows potential in polishing conductive materials with high resolution and accuracy.
Ultra-precision polishing of conductive components of novel electronic and optical devices at small scales is of paramount importance for achieving desired product performance and quality. Herein, the feasibility and performance of the electrorheological fluid-assisted polishing (ERFP) approach in processing conductive materials are theoretically and experimentally investigated. The combination models for ERFP fluid with various size ratios of the polarized particles are established and discussed. A theoretical model for calculating the material removal volume in the ERFP process is derived to predict the polishing performance and the surface profile of the specimens. The measured material removal profiles agree well with the theoretical predictions, confirming the effectiveness of the proposed model. Experimental results demonstrate that the removal volume decreases rapidly with the increasing gap size and the rotation speed. With a microneedle-like tool electrode, the ERFP is able to removal the material in a well-controlled way, demonstrating its ability to polish conductive materials with high resolution and accuracy.

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