Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 13, Issue 4, Pages 5772-5781Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsami.0c19665
Keywords
block copolymers; self-assembly; thin films; directed self-assembly; nanopatterning; nanoscratch
Funding
- National Research Foundation of Korea (NRF) - Korea Government (MSIT) [NRF-2016M3A7B4905624, NRF-2018R1A5A1024127, NRF-2019K1A3A1A14065772]
- Global Ph.D. Fellowship Program [NRF-2017H1A2A1042550]
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Nanoscratch-directed self-assembly (DSA) is introduced as a simple and scalable strategy to achieve highly aligned block copolymer (BCP) nanopatterns over a large area, allowing versatile nanofabrication for various functional nanomaterials.
Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.
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