Journal
ELECTRONICS
Volume 9, Issue 9, Pages -Publisher
MDPI
DOI: 10.3390/electronics9091380
Keywords
ion implantation; gallium nitride; thermodynamics; ultra-high-pressure annealing; diffusion; diffusion coefficients
Categories
Funding
- Polish National Science Center [2018/29/B/ST5/00338]
- TEAM TECH program of the Foundation for Polish Science
- European Union under the European Regional Development Fund [POIR.04.04.00-00-5CEB/17-00]
- MEXT Research and development of next-generation semiconductor to realize energy-saving society [JPJ005357]
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It is well known that ion implantation is one of the basic tools for semiconductor device fabrication. The implantation process itself damages, however, the crystallographic lattice of the semiconductor. Such damage can be removed by proper post-implantation annealing of the implanted material. Annealing also allows electrical activation of the dopant and creates areas of different electrical types in a semiconductor. However, such thermal treatment is particularly challenging in the case of gallium nitride since it decomposes at relatively low temperature (similar to 800 degrees C) at atmospheric pressure. In order to remove the implantation damage in a GaN crystal structure, as well as activate the implanted dopants at ultra-high pressure, annealing process is proposed. It will be described in detail in this paper. P-type GaN implanted with magnesium will be briefly discussed. A possibility to analyze diffusion of any dopant in GaN will be proposed and demonstrated on the example of beryllium.
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