4.6 Article

Substrate temperature induced physical property variation of InxAl1-xN alloys prepared on Al2O3 by magnetron sputtering

Journal

VACUUM
Volume 179, Issue -, Pages -

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2020.109512

Keywords

InxAl1-xN; Magnetron sputtering; Substrate temperature; Optical and electrical properties

Funding

  1. National Natural Science Foundation of China [61674052, 11404097]
  2. Key Scientific Research Projects of Higher Education Institutions of Henan Province, China [20A140012]
  3. training plan of young backbone teachers in Colleges and universities of Henan Province [2018GGJS054]
  4. Innovation and Entrepreneurship Training Program for Provincial Undergraduates of Henan Province [S201910464024]
  5. Student Research Training Program of Henan University of Science and Technology [2019208]
  6. Student Research Training Program of School of Physics and Engineering of Henan University of Science and Technology [WLSRTP201910]

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InxAl1-x N alloys were prepared on Al2O3 substrates using radio frequency magnetron sputtering. The physical properties of InxAl1-x N alloys sputtered at different substrate temperatures were systematically studied. The results indicated that the sputtered InxAl1-x N alloys had c-axis preferred orientation and exhibited phase separation under the substrate temperature over 450 degrees C. The In content was calculated about 0.62 according to the Vegard's law. It was found that the surface morphology of In-0.62 Al-0.38 N alloys showed a transition from nanodots to nanoclusters and disordered morphology as the substrate temperature was increased from 150 to 450 degrees C. This research will lay a good foundation for the application of InxAl1-x N-based optoelectronic devices.

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