4.7 Article

Patterning of polypyrrole using protein-based template and their potential application in resist

Journal

POLYMER
Volume 212, Issue -, Pages -

Publisher

ELSEVIER SCI LTD
DOI: 10.1016/j.polymer.2020.123151

Keywords

Pattern; Polypyrrole; Bovine serum albumin; Microstructure

Funding

  1. National Natural Science Foundation of China [51802259]
  2. China Postdoctoral Science Foundation [2019M663785]
  3. Natural Science Foundation of Shaanxi [2019JQ-510]
  4. Opening Project of Shanxi Key Laboratory of Advanced Manufacturing Technology [XJZZ202001]
  5. Scientific Research Project of Shaanxi Education Department [20JS108]
  6. Promotion Program for Youth of Shaanxi University science and technology association [20190415]
  7. Fund of Key laboratory of Processing and Quality Evaluation Technology of Green Plastics of China National Light Industry council [PQETGP2019003]
  8. Innovation Guidance of Technology Program of Shaanxi Province [2020CGXNG-022]

Ask authors/readers for more resources

Micropatterned BSA/PPy hybrid film has been studied as a template or resist for photolithography, showing not only high electrical conductivity but also photosensitive features and adhesion. It can generate geometrically complex micropatterns in photolithography and exhibit high transferability in chemical etching system, demonstrating practical significance in microfabrication field.
Micropatterned conducting polymer such as polypyrrole (PPy) have attracted growing interest due to their unique properties, such as high electrical conductivity, facile synthesis and well stability. In this work, precise control the micropattern is conceived into bovine serum albumin (BSA)/polypyrrole(PPy) hybrid film as a template or resist for photo lithography. The hybrid films are prepared by a facile and assembly in moderate conditions with handleability. According to the analyses, mircropatterned BSA/PPy film could introduce other valuable characteristics for micro-fabrication in addition to electrical conductivity, such as photosensitive features and adhesion. The patterns can be realized onto underlying Au/Cu/Si/PET substrates. Photo lithography on BSA/PPy film-based template could generate geometrically complex micropatterns at an irradiation dose of 8000 mu C/cm(2). Furthermore, the investigation for the hybrid as resist in chemical etching system suggests that the hybrid can be transferred on the silicon substrate, demonstrating the practical significance in the microfabrication field. The BSA/PPy film provides a novel and green material for the micro-fabrication of polypyrrole, promoting micro-device applications.

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