4.6 Article

Growth and characterization of Si-doped β-Ga2O3 films by pulsed laser deposition

Journal

OPTICAL MATERIALS
Volume 108, Issue -, Pages -

Publisher

ELSEVIER
DOI: 10.1016/j.optmat.2020.110145

Keywords

Physical vapor deposition; Epitaxial growth; Thin films; Structural

Funding

  1. National Natural Science Foundation of China [51972283, 91833301]

Ask authors/readers for more resources

((2) over bar 01) oriented Si-doped beta-Ga2O3 films were grown on (0001) sapphire substrates with different SiO2 content in the targets by pulsed laser deposition (PLD). A carrier density of 8.3 x 10(18) cm(-3) and a Hall mobility of 0.07 cm(2) V(1)s(1) have been observed for film grown with 1.5 wt % SiO2 content in the target. Optical transmission spectra show that all the films have high visible region transmittance. Our work shows that PLD is an effective technique for growing conductive Si-doped beta-Ga2O3 films.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available