4.6 Article

Demonstration of Tunneling Field-Effect Transistor Ternary Inverter

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 67, Issue 10, Pages 4541-4544

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2020.3017186

Keywords

Ternary inverter; TFET ternary CMOS (T-CMOS); tunnel FETs (TFET); vertical TFET

Funding

  1. Brain Korea 21 Plus Project in 2020
  2. Future Semiconductor Device Technology Development Program - Ministry of Trade, Industry and Energy (MOTIE) [10067739, 10080575]
  3. Korea Semiconductor Research Consortium (KSRC) [10067739, 10080575]
  4. Synopsys Inc.

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We demonstrate tunnel FET (TFET)-based ternaryCMOS (T-CMOS) which can operate at supply voltage (V-DD) < 0.6 V. The TFET T-CMOS consists of the vertical n/p TFETs and their drain current (I-D)-gate voltage (V-G) characteristics have sub-60mV/dec steep subthreshold swing (SS) and hump as the gate and source are overlapped. To verify the formation mechanism of the third output voltage state (V-3rd) in the TFET T-CMOS, I-D-V(G)s are analyzed with respect to various drain voltages (V-D). As a result, it is revealed that I-D-V(G)s of the n/p TFETs can have the wider flat ON-current regions at smaller VD by drain-side channel inversion and stable V-3rd can be formed through the voltage dividing between them. Furthermore, it is found that the hump plays a role to make the steeper output voltage transitions by increasing the I-D difference between the n/p TFETs.

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