4.6 Article

Ultrahigh emissivity of grating-patterned PDMS film from 8 to 13 μm wavelength regime

Journal

APPLIED PHYSICS LETTERS
Volume 117, Issue 9, Pages -

Publisher

AIP Publishing
DOI: 10.1063/5.0017838

Keywords

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Funding

  1. National Research Foundation of Korea (NRF) - Ministry of Science and ICT [NRF-2020R1A2C3004885, NRF-2020R1A4A4078930, NRF-2018M3D1A1058998]
  2. Korea Institute of Energy Technology Evaluation and Planning (KETEP)
  3. Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea [20172010000850]
  4. Korea Evaluation Institute of Industrial Technology (KEIT) [20172010000850] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Polydimethylsiloxane (PDMS) is a prominent material for radiative cooling due to its promising optical properties in the mid-infrared spectral region as well as its fabrication easiness. Even though several works have reported that the mid-infrared emissivity of a PDMS film can be increased by surface modification, there is still room for further enhancement through global optimization. Here, we designed and fabricated the thin PDMS film patterned with two-dimensional gratings to obtain the highest emissivity in the wavelength range from 8 to 13 mu m. A surrogate-model-based optimization was performed, and the optimum structure exhibited the averaged emissivity value of 0.99 in the wavelength of 8-13 mu m, which is the highest value reported to date among polymer-based radiative coolers. For real-world applications, we also developed the fabrication method that is repeatable and applicable for various surfaces using a flexible master mold.

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