Journal
MATERIALS RESEARCH EXPRESS
Volume 7, Issue 7, Pages -Publisher
IOP Publishing Ltd
DOI: 10.1088/2053-1591/aba557
Keywords
thin films; atomic layer deposition; titanium dioxide; aluminum oxide; electrochemical impedance spectroscopy
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Funding
- Brazilian agency program FAPESP/MCT/CNPq-PRONEX [2011/507730]
- Brazilian agency FAPESP [2018/01265-1, 2016/17826-7, 14/18139-8]
- Brazilian agency CNPq [303818/2018-2, 437921/2018-2]
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Titanium dioxide (TiO2) and aluminum oxide (Al2O3) thin films, with thicknesses around 100 nm, were grown on commercial pure- and resin-coated Al substrates using the atomic layer deposition (ALD). A comprehensive and comparative study of corrosion protection was carried out by linear sweep voltammetry (LSV) and electrochemical impedance spectroscopy (EIS) measurements for a set of six samples: two reference samples (Al-bare and Al-resin), and four ALD coated samples (Al-TiO2, Al-Al2O3, Al-resin-TiO2, and Al-resin-Al2O3). The LSV and EIS results display good mutual agreement, indicating a higher protection efficiency of all ALD-coated samples after immersion in NaCl. When compared to Al-bare, all ALD coated samples (TiO2 or Al2O3) showed a corrosion inhibition enhancement factor of 99%. Besides, our results demonstrated that Al-resin+Al2O3 has 24.95% and 33.40% more corrosion inhibition than Al-Al2O3 and Al-resin, respectively. EIS data were fitted by an equivalent electric circuit (EEC). The Nyquist and Bode plots from the experiments showed that ALD films are a potential candidate for altering/improving commercial resin-coated Al cans.
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