Journal
MATERIALS RESEARCH EXPRESS
Volume 7, Issue 6, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/2053-1591/ab98cc
Keywords
DMD; multi-layer lithography; SU-8; focal plane changing
Categories
Funding
- Research and Development planning project in key areas of Guangdong Province [2020B090924001]
- Guangzhou Science and Technology planning project [202002030210]
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In this paper, we report on a type of SU-8 microstructure with vertical sidewalls used for polydimethydiloxane (PDMS) microchannels. Multi-layer lithography using focal plane changing approach is proposed to expose the SU-8 photoresist based on a digital micromirror device (DMD) maskless lithography system. We used a light-emitting diode source with a wavelength of 405 nm. The thickness of the SU-8 is divided into multi-layers according to the depth of focus. Each layer corresponds to a depth of focus, and then, a virtual mask is designed for the layer. Finally, each layer is exposed to changes in the focal plane. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-profiles. Additionally, there is better linewidth in the proposed method compared with multi-exposure by a single fixed focal plane. The PDMS microchannels result also demonstrate the stability of the SU-8 mold.
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