Journal
VACUUM
Volume 177, Issue -, Pages -Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2020.109378
Keywords
Tungsten trioxide; Glancing angle deposition; Thin films; Magnetron sputtering; Ellipsometry
Funding
- NCN Sonata [2017/26/D/ST7/00355]
- AGH University [16.16.230.434]
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The deposition process and investigation of the physical properties of tungsten trioxide (WO3) thin films are presented in this paper. The WO3 thin films were deposited by magnetron sputtering technology with glancing angle deposition technique (GLAD) in a reactive mode. The substrate tilt angle various from 45 degrees to 90 degrees and 0 degrees, and the sample rotation at a speed of 20 rpm was stabilized by the GLAD manipulator. After deposition, the samples were annealed at 400 degrees C/4h in air. Thin WO3 films were deposited on glass, quartz and silicon substrate. The crystal structure, morphology, and optical properties were determined by several x-ray measurements, optical spectroscopy, and spectroscopic ellipsometry. The structural and optical properties of the deposited films are presented and discussed.
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