4.8 Article

Ultrasensitive Phototransistor Based on WSe2-MoS2 van der Waals Heterojunction

Journal

NANO LETTERS
Volume 20, Issue 8, Pages 5741-5748

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.0c01460

Keywords

photodetector; MoS2; WSe2; van der Waals heterostructure; phototransistor

Funding

  1. National Research Foundation of Korea (NRF) through the Creative Materials Discovery Program [2016M3D1A1900035]
  2. National Research Foundation of Korea (NRF) through Basic Research Program [2019R1A2C2009171]
  3. National Research Foundation of Korea [2019R1A2C2009171] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Band engineering using the van der Waals heterostructure of two-dimensional materials allows for the realization of high-performance optoelectronic devices by providing an ultrathin and uniform PN junction with sharp band edges. In this study, a highly sensitive photodetector based on the van der Waals heterostructure of WSe2 and MoS2 was developed. The MoS2 was utilized as the channel for a phototransistor, whereas the WSe2-MoS2 PN junction in the out-of-plane orientation was utilized as a charge transfer layer. The vertical built-in electric field in the PN junction separated the photogenerated carriers, thus leading to a high photoconductive gain of 10(6). The proposed phototransistor exhibited an excellent performance, namely, a high photoresponsivity of 2700 A/W, specific detectivity of 5 x 10(11) Jones, and response time of 17 ms. The proposed scheme in conjunction with the large-area synthesis technology of two-dimensional materials contributes significantly to practical photodetector applications.

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