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Alleviation mechanisms of metal(loid) stress in plants by silicon: a review

Journal

JOURNAL OF EXPERIMENTAL BOTANY
Volume 71, Issue 21, Pages 6744-6757

Publisher

OXFORD UNIV PRESS
DOI: 10.1093/jxb/eraa288

Keywords

Abiotic stress; antioxidant; apoplasmic barrier; cell wall; gene expression; metalloid; metal transporter; metal uptake; oxidative stress; silicon (Si)

Categories

Funding

  1. Slovak Grant Agency VEGA
  2. VEGA grant [1/0605/17]
  3. Slovak Research and Development Agency [APVV-17-0164, APVV SK-PL-18-0078, APVV SK-PT-18-0020]
  4. Research and Development Operational Programme - ERDF [ITMS 26240220086]

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Silicon (Si), although not considered as an essential element for plants in general, can ameliorate the phytotoxicity induced by excess metal(loid)s whether non-essential (e.g. Cd, Pb, Cr, Al, As, and Sb) or essential (e.g. Cu, Ni, and Zn). The Si-enhanced resistance allowing plants to cope with this type of abiotic stress has been developed at multiple levels in plants. Restriction of root uptake and immobilization of metal(loid)s in the rhizosphere by Si is probably one of the first defence mechanism. Further, retention of elements in the root apoplasm might enhance the resistance and vigour of plants. At the cellular level, the formation of insoluble complexes between Si and metal(loid)s and their storage within cell walls help plants to decrease available element concentration and restrict symplasmic uptake. Moreover, Si influences the oxidative status of plants by modifying the activity of various antioxidants, improves membrane stability, and acts on gene expression, although its exact role in these processes is still not well understood. This review focuses on all currently known plant-based mechanisms related to Si supply and involved in amelioration of stress caused by excess metal(loid)s.

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