PECVD synthesis of ZnO/Si thin film as a novel adsorbent for removal of azithromycin from water samples

In the current study, ZnO/Si thin film was prepared through a plasma-enhanced chemical vapour deposition (PECVD) method and used for the elimination of azithromycin (AZM) from various real samples. Some specs about the structure and morphology of the ZnO/Si thin film were systematically examined utilising approaches such as X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), and Scanning electron microscopy (SEM). The adsorption of AZM on the ZnO/Si thin film was accomplished under various statuses that are equilibrium time = 45 min, adsorbent dose = 0.025, pH solution = 7.0, and primary AZM concentration = 15 mg L-1. Four models were utilised to monitoring the adsorption kinetic of AZM onto ZnO/Si thin film: pseudo-first order (PFO), pseudo-second order (PSO), Elovich (E) and intraparticle diffusion (ID) models. Equilibrium data were ?tted to Langmuir (L), Freundlich (F), Temkin (T) and Redlich-Peterson (R-P) isotherm models. The elimination efficiency of AZM via ZnO/Si thin film was evaluated in three real samples. Finally, it should be noted that AZM loaded on the adsorbent could be easily desorbed with 0.1 mol L(-1)HNO(3)and the adsorbent showed good reusability for adsorption of the studied drug.

Automated summary

In this study, a ZnO/Si thin film was prepared using the PECVD method and used for AZM removal from various real samples. The structure and morphology of the ZnO/Si thin film were analyzed using XRD, XPS, and SEM. The adsorption kinetics of AZM on the ZnO/Si thin film were investigated using four models, and the equilibrium data were fitted to several isotherm models. The removal efficiency of AZM using the ZnO/Si thin film was evaluated in three real samples, and the adsorbent showed good reusability for the studied drug.