4.4 Article

Improving Electrical Stability of a-InGaZnO Thin-Film Transistors with Thermally Deposited Self-Assembled Monolayers

Journal

ELECTRONIC MATERIALS LETTERS
Volume 16, Issue 5, Pages 451-456

Publisher

KOREAN INST METALS MATERIALS
DOI: 10.1007/s13391-020-00232-1

Keywords

Oxide thin-film transistor; InGaZnO; Reliability; Self-assembled monolayer; Low-temperature passivation

Funding

  1. INHA University research grant [63090-01]

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Amorphous InGaZnO (a-IGZO) TFTs become mainstream at the forefront of display backplanes and are actively expanding their area for next-generation optoelectronic devices such as flexible and transparent displays. For flexible displays, low temperature processed passivation technology is required to keep the reliability of the electrical properties in a-IGZO TFTs without damaging flexible plastic substrates. Here, we proposed a low-temperature passivation process using a dual-chamber system. A high-quality passivation layer composed of octadecyl-trichlorosilane was formed at 140 degrees C under vacuum on the back-channel of a-IGZO TFTs using the system. The thermally deposited self-assembled monolayers (SAMs) enable the formation of hydrophobic surfaces on a-IGZO TFTs, leading to the protection of the back-channel against water and oxygen efficiently. As a result, the electrical characteristics such as the threshold voltage shift, hysteresis, field-effect mobility, and negative bias stress of the SAM treated TFTs were significantly improved compared to those of the control TFTs. [GRAPHICS] .

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