4.2 Article

Electrodeposition of Copper Metal from the 1-Ethyl-3-methylimidazolium Fluoride ([EMIM]F)-urea-H2O System Containing Cu2O

Journal

ELECTROCHEMISTRY
Volume 88, Issue 4, Pages 253-255

Publisher

ELECTROCHEMICAL SOC JAPAN
DOI: 10.5796/electrochemistry.20-00031

Keywords

Cu Electrodeposition; Imidazolium Fluoride; Urea; Copper

Funding

  1. National Natural Science Foundation of China [51804070]
  2. Guangxi Innovation Driven Development Project [GUIKE AA18118030]
  3. Fundamental Research Funds for the Central Universities [N172502003]

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In this work, [EMIM]F-urea-H2O system is capable of dissolving Cu2O, and then the metallic copper was electrodeposited from this system at room temperature. The reduction of Cu (I) in this system involves a quasi-reversible and one-step single-electron transfer process. The electrodeposition of copper was performed on a tungsten (W) substrate at -0.67 V (vs. Ag) and 353 K via potentiostatic electrolysis. The electrodeposits were identified as metallic copper, as verified by XRD and EDS. SEM image shows that uniform, polygonal nanoparticles of copper were obtained after the potentiostatic static electrolysis. (C) The Author(s) 2020. Published by ECSJ.

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