4.8 Article

Stable Silicene Wrapped by Graphene in Air

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 12, Issue 36, Pages 40620-40628

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.0c05610

Keywords

silicene; graphene; CVD synthesis; DFT calculation; X-ray absorption spectroscopy

Funding

  1. National Science and Technology Major Project from the Ministery of Science and Technology of China [2018AAA0103104]
  2. Natural Science Foundation of China (NSFC) [U1932124]
  3. National Key R&D Program of China [2017YFA0205002]
  4. Collaborative Innovation Center of Suzhou Nano Science Technology
  5. Priority Academic Program Development of Jiangsu Higher Education Institutions (PAPD)
  6. 111 Project
  7. Joint International Research Laboratory of Carbon-Based Functional Materials and Devices

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Silicene as a novel and unique two-dimensional nanomaterial attracts considerable research interest; however, obtaining free-standing silicene still poses challenges due to its instability in air. In this work, we report the synthesis of protected silicene through chemical vapor deposition (CVD), in which silicene is sandwiched by graphene (G@S@G) covered on a Cu substrate. Graphene plays the role of both a substrate and protector, which can help silicene stabilize in air. These findings were verified by means of advanced microscopic and spectroscopic investigations accompanied by density functional theory (DFT) simulations. A large area of G@S@G can be obtained and tailored in any type of shape based on the Cu film. G@S@ G shows n-type semiconductor character confirmed by a field-effect transistor (FET) device.

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