4.6 Article

Atomic Layer-Deposited Al-Doped ZnO Thin Films for Display Applications

Journal

COATINGS
Volume 10, Issue 6, Pages -

Publisher

MDPI
DOI: 10.3390/coatings10060539

Keywords

Al-doped ZnO; ALD technique; transparent conductive layers; LC display; flexible PDLC devices

Funding

  1. Bulgarian Science Fund [KPi-06-H-28/8]
  2. Ministry of Science and Technology (MOST), Taiwan [MOST 107-2221-E-009-120-MY3, MOST 109-2927-I-009-507]
  3. Higher Education Sprout Project of the National Chiao Tung University
  4. Ministry of Education (MOE), Hsinchu, Taiwan
  5. Bulgarian Ministry of Education and Science [D01-284/17.12.2019]

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The integration of high uniformity, conformal and compact transparent conductive layers into next generation indium tin oxide (ITO)-free optoelectronics, including wearable and bendable structures, is a huge challenge. In this study, we demonstrate the transparent and conductive functionality of aluminum-doped zinc oxide (AZO) thin films deposited on glass as well as on polyethylene terephthalate (PET) flexible substrates by using an atomic layer deposition (ALD) technique. AZO thin films possess high optical transmittance at visible and near-infrared spectral range and electrical properties competitive to commercial ITO layers. AZO layers deposited on flexible PET substrates demonstrate stable sheet resistance over 1000 bending cycles. Based on the performed optical and electrical characterizations, several applications of ALD AZO as transparent conductive layers are shown-AZO/glass-supported liquid crystal (LC) display and AZO/PET-based flexible polymer-dispersed liquid crystal (PDLC) devices.

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