4.7 Article

Novel Method for Electroless Etching of 6H-SiC

Journal

NANOMATERIALS
Volume 10, Issue 3, Pages -

Publisher

MDPI
DOI: 10.3390/nano10030538

Keywords

chemical etching; silicon carbide; nanoparticles; X-ray photoemission spectroscopy; photoluminescence spectroscopy

Funding

  1. Hungarian NKFIH of the EU QuantERA Nanospin project [127902]
  2. NKFIH [2017-1.2.1-NKP-2017-00001, NVKP_16-1-2016-0043]
  3. Bolyai Research Scholarship of HAS
  4. National Talent Program [NTP-NFTO-18-B-0243]
  5. National Excellence Program [UNKP-19-4-BME-83]
  6. OTKA SNN [118012]
  7. EMMI (BME FIKP-NAT)

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In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs.

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