Fabrication and patterning of stretchable Ag nanowire network films embedded in an elastomeric polymer matrix

Highly transparent, stretchable electrode films were fabricated by embedding Ag nanowire (Ag NW) network in a transparent elastomeric polymer matrix. The Ag NW network was first constructed on a polymethylmethacrylate film using a wet coating process. The obtained Ag NW network was then transferred to the surface of a UV-curable elastomeric polymer film. Transmittance by the resulting film was considerable at over 80 % despite its high conductivity (60 Omega/sq). Its mechanical elasticity was outstanding and reached 30 %. The surface of the film was uniform, and it was resistant to oxidation and moisture. We developed a new wet-etching process that enabled patterning with line widths below 15 mu m for application to stretchable electronic devices.