4.8 Article

Effects of Ion Energy and Density on the Plasma Etching-Induced Surface Area, Edge Electrical Field, and Multivacancies in MoSe2 Nanosheets for Enhancement of the Hydrogen Evolution Reaction

Journal

SMALL
Volume 16, Issue 25, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.202001470

Keywords

edge electric field; etched through-holes; hydrogen evolution reaction; multivacancies; plasma simulation; plasma-induced damage

Funding

  1. Hong Kong Scholars Program [XJ2018009]
  2. City University of Hong Kong Strategic Research Grant (SRG) [7005105]

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Plasma functionalization can increase the efficiency of MoSe2 in the hydrogen evolution reaction (HER) by providing multiple species but the interactions between the plasma and catalyst are not well understood. In this work, the effects of the ion energy and plasma density on the catalytic properties of MoSe2 nanosheets are studied. The through-holes resulting from plasma etching and multi-vacancies induced by plasma-induced damage enhance the HER efficiency as exemplified by a small overpotential of 148 mV at 10 mA cm(-2) and Tafel slope of 51.6 mV dec(-1) after the plasma treatment using a power of 20 W. The interactions between the plasma and catalyst during etching and vacancies generation are evaluated by plasma simulation. Finite element and first-principles density functional theory calculations are also conducted and the results are consistent with the experimental results, indicating that the improved HER catalytic activity stems from the enhanced electric field and more active sites on the catalyst, and reduced bandgap and adsorption energy arising from the etched through-holes and vacancies, respectively. The results convey new fundamental knowledge about the plasma effects and means to enhance the efficiency of catalysts in water splitting as well insights into the design of high-performance HER catalysts.

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