Journal
PLASMA PROCESSES AND POLYMERS
Volume 17, Issue 7, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.202000032
Keywords
atmospheric plasma; low-kdielectric; nanosecond pulsed discharges; plasma-initiated chemical vapour deposition; ultrathin polymer film
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The growth mechanisms of low dielectric constant polymer thin films elaborated from the atmospheric-pressure plasma-initiated chemical vapour deposition (AP-PiCVD) reaction of a cyclic vinyl organosiloxane are experimentally elucidated in this study. The use of ultrashort plasma pulses (ca. 100 ns), as a polymerisation initiator, with long plasma off-times results in the formation of atomically smooth thin films. The increase of the monomer saturation ratio,P-M/P-sat, results in an increase in the growth rate and a better retention of the cyclic structure of the monomer, promoting lower dielectric constants. Based on this experimental study, guidelines are provided to determine the optimal process window for the AP-PiCVD of functional polymer thin films.
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