4.6 Article

Extended line defects in BN, GaN, and AlN semiconductor materials: Graphene-like structures

Journal

CHEMICAL PHYSICS LETTERS
Volume 652, Issue -, Pages 73-78

Publisher

ELSEVIER
DOI: 10.1016/j.cplett.2016.04.045

Keywords

Boron nitride; Aluminum nitride; Gallium nitride; Graphene-like; Ab-initio; Defects; III-V materials

Funding

  1. CONACYT-Mexico [60218-F1]
  2. National Laboratory for Nanoscience and Nanotechnology Research (LINAN)

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The extended line defect (ELD) mimicking grain boundaries in two-dimensional systems is theoretically investigated in BN, GaN, and AlN semiconductor materials with a single layer honeycomb structure. The ELD consists of octagonal-square membered rings. Density functional calculations of the electronic density of states, scanning tunneling microscopy and transmission electron microscopy image simulations are analyzed. Our results revealed that the ELDs are stable in all considered monolayers. In addition, electronic density of states calculations demonstrated that in gap states are emerged when ELD is incorporated into the honeycomb structures. Finally, results on armchair nanoribbons with bare-edges and hydrogenated edges are discussed. (C) 2016 Elsevier B.V. All rights reserved.

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