A novel magnetic field-assisted mass polishing of freeform surfaces

This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.