4.8 Article

Hexagonal Boron Nitride Single Crystal Growth from Solution with a Temperature Gradient

Journal

CHEMISTRY OF MATERIALS
Volume 32, Issue 12, Pages 5066-5072

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.chemmater.0c00830

Keywords

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Funding

  1. Materials Engineering and Processing program of the National Science Foundation [CMMI 1538127]
  2. NSF [CHE-1726332]
  3. Singapore National Research Foundation
  4. Ministry of Education (MOE), Singapore, under AcRF Tier 3 [MOE2018-T3-1-005]
  5. National Science Foundation (NSF) through the 2D Crystal Consortium-Materials Innovation Platform (2DCC-MIP) under NSF cooperative agreement [DMR-1539916]
  6. NSF CAREER Grant [DMR-1760668]

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Hexagonal boron nitride (hBN) is attracting much attention due to its tremendous applications including nano-photonic and electronic devices, substrates for two-dimensional (2D) materials, heat management materials, etc. To achieve the best device performance, large area hBN single crystals are required. Herein, large-area (>500 mu m each), high-quality (defect density < 0.52/mu m(2)) bulk hBN single crystals are grown from molten metal solutions with a temperature gradient. The narrow Raman line widths of the intralayer E-2g mode peak and the interlayer shear mode, the strong and sharp phonon-assisted transition photoluminescence peaks, and the high thermal conductivity demonstrate that the hBN produced by this method has a high crystal quality with a low density of defects. Atomic force microscope images show that atomically flat layers of hBN can be produced by exfoliation. This study not only demonstrates a new strategy for growing large hBN single crystals but also provides high quality thick and thin hBN layers for nanodevice applications.

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