Journal
NATURE COMMUNICATIONS
Volume 11, Issue 1, Pages -Publisher
NATURE PUBLISHING GROUP
DOI: 10.1038/s41467-019-14022-3
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Funding
- NSF EFRI 2-DARE [1542879]
- Centre National de la Recherche Scientifique (CNRS)
- Commissariat `a l'Energie Atomique et aux Energies Alternatives (CEA), France
- Center for the Computational Design of Functional Layered Materials, an Energy Frontier Research Center - U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES) [DE-SC0012575]
- U.S. Department of Energy by Lawrence Livermore National Laboratory [DE-AC52-07NA27344]
- NSF [EFRI 2-DARE 1542707, EAGER 1838456]
- NSFC-RGC Joint Research Scheme [N_HKUST607/17]
- Guangzhou Science and Technology Project [201704030134]
- German Research Council (DFG) [GE2827/1-1, GE2827/2-1]
- NSF MRSEC [DMR1720530]
- Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division of the U.S. Department of Energy [DE-AC02-05-CH11231]
- National Science Foundation [DMR-1719353]
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The properties of van der Waals (vdW) materials often vary dramatically with the atomic stacking order between layers, but this order can be difficult to control. Trilayer graphene (TLG) stacks in either a semimetallic ABA or a semiconducting ABC configuration with a gate-tunable band gap, but the latter has only been produced by exfoliation. Here we present a chemical vapor deposition approach to TLG growth that yields greatly enhanced fraction and size of ABC domains. The key insight is that substrate curvature can stabilize ABC domains. Controllable ABC yields similar to 59% were achieved by tailoring substrate curvature levels. ABC fractions remained high after transfer to device substrates, as confirmed by transport measurements revealing the expected tunable ABC band gap. Substrate topography engineering provides a path to large-scale synthesis of epitaxial ABC-TLG and other vdW materials.
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