Journal
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 35, Issue 5, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/1361-6641/ab7843
Keywords
halide vapor phase epitaxy; gallium oxide; metastable
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Funding
- Innovative Science and Technology Initiative for Security, ATLA, Japan
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We investigated the effect of supply conditions of GaCl, O2, and additional HCl on the growth rate of ( 0001) a-Ga2O3 by halide vapor phase epitaxy and the crystal properties. The parasitic gas-phase reaction was markedly suppressed by supplying HCl gas in addition to GaCl and O2, and a rapid growth rate as high as 101 mu mh-1 was achieved. Thermodynamic analysis revealed that the addition of HCl works to convert GaCl into GaCl3, and it was elucidated that the parasitic gas-phase reaction was suppressed because a-Ga2O3 was grown through the chemical reaction of GaCl3 and the oxygen sources (O2 and/or H2O), the equilibrium constant of which is much smaller than that when GaCl is used. The full-width at half-maximum of the x-ray rocking curve of 101 2 diffraction measured in skew-symmetric geometry decreased with increasing growth rate by increasing the precursor supply, whereas that of symmetric 0006 diffraction did not show a systematic tendency. H and Cl impurities were detected in the unintentionally doped epilayers by secondary ion mass spectrometry. [Cl] increased rapidly with increasing growth rate, reaching 1.4.x.1018 cm-3 at 101 mu mh-1. The VI/III ratio difference did not have a significant effect on [H] or [Cl]. a-Ga2O3 islands were formed through selective area growth, and the lateral/vertical growth rate ratio decreased with increasing growth rate.
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