Journal
OPTIK
Volume 203, Issue -, Pages -Publisher
ELSEVIER GMBH
DOI: 10.1016/j.ijleo.2019.163532
Keywords
Graphene; Optical nanopatterning; Quantum Optical Lithography; Nanoablation; SEM; Raman characterization
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We have investigated the optical nanopatterning of trilayer graphene. Multiple 20 nm parallel lines were written by Quantum Optical Lithography. Partial and complete nanoablation have been studied. The electrons emission from nanosized area of the resist has produced nanoablation. The writing method could be applied to prototype nanodevice with different 2D materials.
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